- All
- Product Name
- Product Keyword
- Product Model
- Product Summary
- Product Description
- Multi Field Search
 |
| Quantity: | |
|---|---|
·CMP Polishing Pad
product name：
CMP Polishing Pad
product model：JH5900
Product Description:
The CMP pad is made of PET composite carbon film synthesized by a special process. The surface of the finished product is smooth and flat, scratch-resistant, acid and alkali resistant. The permanent surface resistance value is less than 1K Ω, which is uniform and stable. It can quickly disperse accumulated powder during polishing. Compared with polishing pads made by traditional coating method, this product has a longer life span (2.5-5 times more durable).
Application:
Used wafer polishing process.
The main technical parameters:
General resistance（Ω/Sq） | Thickness（μm） | Width（mm） | Length（m） | Using Temperature（℃） |
≤ 1K | 40~50 | 5~520 | Customized | -100~260 |
·CMP Polishing Pad
product name：
CMP Polishing Pad
product model：JH5900
Product Description:
The CMP pad is made of PET composite carbon film synthesized by a special process. The surface of the finished product is smooth and flat, scratch-resistant, acid and alkali resistant. The permanent surface resistance value is less than 1K Ω, which is uniform and stable. It can quickly disperse accumulated powder during polishing. Compared with polishing pads made by traditional coating method, this product has a longer life span (2.5-5 times more durable).
Application:
Used wafer polishing process.
The main technical parameters:
General resistance（Ω/Sq） | Thickness（μm） | Width（mm） | Length（m） | Using Temperature（℃） |
≤ 1K | 40~50 | 5~520 | Customized | -100~260 |
